Si etching solution (isotropic)
We perform good isotropic etching of the Si film. In addition to standard isotropic etching solutions, we also have thinning etching solutions that are optimal for thinning Si substrates.
The features of this product are as follows: - Processing at low temperatures and in a short time is possible. - The surface after etching is mirror-like. Keywords: wet etching, silicon isotropic etching, silicon substrate thinning
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
